Examiner Nuckols Tiffany Z

1716-NUCKOLS-TIFFANY-Z

Employment Information

Art Unit:1716 — Coating apparatus
Group:1710 — Coating, Etching, Cleaning, Single Crystal Growth
Classes: 118 — Coating apparatus
156 — Adhesive bonding and miscellaneous chemical manufacture
219 — Electric heating
429 — Chemistry: electrical current producing apparatus, product, and process
438 — Semiconductor device manufacturing: process
269 — Work holders
216 — Etching a substrate: processes
204 — Chemistry: electrical and wave energy
427 — Coating processes
Phone:(571) 270-7377
Email:tiffany.nuckols@uspto.gov
Location:VA 22314
Title:Pat Examnr Gen Chem
Service:18 years
Grade:GS-13

Grant Rate and Difficulty Ranking

88
3-Year Grant rate: 36% over 158 cases
Difficulty: Very Hard
Difficulty Percentile: 88th

With Examiner Nuckols, you have a 36% chance of getting an issued patent by 3 years after the first office action. Examiner Nuckols is a very hard examiner and in the 88th percentile across all examiners (with 100th percentile most difficult).

Grant Rate

Grant Rate Timeline

Below is the grant rate timeline for Examiner Nuckols, where the timeline is relative to the date of the first office action. The three-year grant rate is the percentage of applications granted at three years after the first office action.

Comparison with Art Unit 1716

Examiner Nuckols's grant rate is lower than that of Art Unit 1716 and lower than that of the USPTO.

Average Office Actions Per Grant
Examiner Nuckols 2.8
Art Unit 1716 1.7

Interview Benefit

Grant Rate without Interview

Examiner Nuckols has granted 26 of 77 cases without any applicant-requested interviews for a grant rate of 34%.

Grant Rate with Interview

Examiner Nuckols has granted 31 of 81 cases with at least one applicant-requested interview for a grant rate of 38%.

Interview Benefit

With Examiner Nuckols, conducting an interview increases your chance of getting a patent granted by 12%.

Recent Dispositions

Recent Dispositions

Number Title OA Rejections Status IFW
17793232 Chemical Vapor Deposition Apparatus Rejection information available with a Premium Stats subscription. See our pricing. Patented View
17139387 System And Methods For A Radiant Heat Cap In A Semiconductor Wafer Reactor Patented View
17486616 Method Of Isolating The Chamber Volume To Process Volume With Internal Wafer Transfer Capability Patented View
17411926 Thermal Choke Plate Patented View
16012120 Temperature Control Systems And Methods For Removing Metal Oxide Films Abandoned View
17881428 Substrate Handling System, Method, And Apparatus Patented View
17694134 Reaction Tube, Substrate Processing Apparatus And Method Of Manufacturing Semiconductor Device Patented View
17860891 Flat Susceptor With Grid Pattern And Venting Grooves On Surface Thereof Abandoned View
17417650 Vapor Deposition Device And Carrier Used In Same Abandoned View
16396109 Plasma Processing Method And Plasma Processing Apparatus Patented View
18534182 Multi-Plate Electrostatic Chucks With Ceramic Baseplates Patented View
17886645 Manufacturing Method For Solar Cell, Solar Cell, And Solar Cell Manufacturing Apparatus Abandoned View
17282095 Susceptor Abandoned View
17064470 Shadow Ring Kit For Plasma Etch Wafer Singulation Process Abandoned View
16480596 Transport Ring Abandoned View
17414763 Reaction Chamber For An Epitaxial Reactor Of Semiconductor Material With Non-Uniform Longitudinal Section And Reactor Patented View
17825874 Plasma Processing Device And Retractable Sealing Part Thereof Patented View
18220161 Manufacturing Apparatus And Method For Making Silicon Nanowires On Carbon Based Powders For Use In Batteries Abandoned View
18220171 Manufacturing Apparatus And Method For Making Silicon Nanowires On Carbon Based Powders For Use In Batteries Abandoned View
17327567 Electrostatic Chuck, Method Of Manufacturing Electrostatic Chuck, And Substrate Processing Apparatus Abandoned View
17190451 Substrate Support, Plasma Processing System, And Method Of Placing Annular Member Abandoned View
18377371 Edge Seal For Lower Electrode Assembly Patented View
18582163 Substrate Support And Plasma Processing Apparatus Abandoned View
17402923 Deposition Apparatus And Display Panel Manufacturing Apparatus Including The Same Patented View
17544433 Configurable Faraday Shield Patented View
17458768 Reactor With Centering Pin For Epitaxial Deposition Patented View
17830744 Plasma Processing Apparatus And Plasma Processing Method Abandoned View
17191085 Plasma Processing Apparatus, Semiconductive Member, And Semiconductive Ring Abandoned View
17508581 Bottom Cover Plate To Reduce Wafer Planar Nonuniformity Patented View
17560228 Plasma Processing Method And Plasma Processing Apparatus Patented View
17166132 Stage, Plasma Processing Apparatus, And Cleaning Method Patented View
16943600 Placement Stage And Substrate Processing Apparatus Patented View
18582329 Substrate Support And Plasma Processing Apparatus Patented View
18175363 Methods And Systems For Heating A Wide Bandgap Substrate Patented View
18525005 Mask Device And Evaporation Device Patented View
17485170 Fixture, Tray And Sputtering System Abandoned View
16369707 Plasma Processing Apparatus And Method Of Transferring Workpiece Abandoned View
17337696 Stage And Substrate Processing Apparatus Patented View
17187410 Structures And Methods For Processing A Semiconductor Substrate Patented View
17252012 Sample Holder Patented View
18498084 Ceramic Susceptor Patented View
17190615 Alignment Fixture For A Reactor System Patented View
17143399 Stage And Plasma Processing Apparatus Patented View
17467880 Plasma Processing Apparatus, Thermal Resistance Acquisition Method, And Thermal Resistance Acquisition Program Patented View
16870438 Methods And Apparatus For Processing A Substrate Patented View
16846502 Methods And Apparatus For Processing A Substrate Abandoned View
17409921 Spray Head, Chemical Vapor Deposition Device, And Working Method Of Chemical Vapor Deposition Device Abandoned View
16619651 Carrying Device And Semiconductor Processing Apparatus Patented View
17785944 Workpiece Support System For Plasma Treatment And Method Of Using The Same Abandoned View
17210686 Semiconductor Processing System Including Temperature Controller Patented View

Appeals Statistics

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